TRANSPARENT-CONDUCTIVE-FILM LAMINATE, MANUFACTURING METHOD THEREFOR, THIN-FILM SOLAR CELL, AND MANUFACTURING METHOD THEREFOR

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United States of America Patent

APP PUB NO 20150303327A1
SERIAL NO

14441198

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention provides a transparent-conductive-film laminate and manufacturing method therefor, transparent-conductive-film laminate being useful as a surface electrode in manufacture of a high-efficiency silicon-based thin-film solar cell, having a roughness structure excellent in light scattering, and having an excellent effect of optical confinement, and provides a thin-film solar cell using transparent-conductive-film laminate and a manufacturing method for the thin-film solar cell. Transparent-conductive-film laminate has a structure including: an indium-oxide-based transparent conductive film (I) having a film thickness of not less than 10 nm and not more than 300 nm; and a zinc-oxide-based transparent conductive film (II) having a film thickness of not less than 200 nm, and has a surface having a crystalline structure with projections and depressions mixed therein, a surface roughness (Ra) of not less than 30 nm, a haze ratio of not less than 8%, and a resistance value of not more than 30 Ω/sq.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO METAL MINING CO LTD11-3 SHIMBASHI 5-CHOME MINATO-KU TOKYO 105-8716

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsumura, Fumihiko Tokyo, JP 16 61
Sogabe, Kentaro Tokyo, JP 13 26
Yamanobe, Yasunori Tokyo, JP 10 37

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