FINFET CELL ARCHITECTURE WITH POWER TRACES

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United States of America Patent

SERIAL NO

14788939

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A finFET block architecture suitable for use of a standard cell library, is based on an arrangement including a first set of semiconductor fins in a first region of the substrate having a first conductivity type, and a second set of semiconductor fins in a second region of the substrate, the second region having a second conductivity type. A patterned gate conductor layer including gate traces in the first and second regions, arranged over channel regions of the first and second sets of semiconductor fins is used for transistor gates. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and can include a plurality of floating power buses over the fins in the first and second regions.

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Patent Owner(s)

Patent OwnerAddress
SYNOPSYS INCMOUNTAIN VIEW CA 94043

International Classification(s)

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  • 2015 Application Filing Year
  • H01L Class
  • 25498 Applications Filed
  • 22451 Patents Issued To-Date
  • 88.06 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAWA, JAMIL CAMPBELL, US 73 1110
MOROZ, VICTOR SARATOGA, US 168 4409
SHERLEKAR, DEEPAK D CUPERTINO, US 24 684

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  • 5 Citation Count
  • H01L Class
  • 10.46 % this patent is cited more than
  • 10 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1377800619237183722181459473474314501 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05001000150020002500300035004000450050005500600065007000750080008500

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