PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME

United States of America Patent

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Sep 30, 2014
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Apr 17, 2014

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Abandoned

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Abstract

A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.

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Patent Owner	Address
AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL	32-36 BOULEVARD D" AVRANCHES LUXEMBOURG L-1160

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Inventor Name	Address	# of filed Patents	Total Citations
Cho, Ki-Hyun	Yongin-City, KR	27	103
Chun, Jun	Yongin-City, KR	31	64
Ju, Jin-Ho	Yongin-City, KR	73	231
Kang, Deok-Man	Anseong-si, KR	11	28
Kim, Ji-Hyun	Yongin-City, KR	189	1734
Lee, Chang-Ik	Anseong-si, KR	4	73
Lee, Jung-Soo	Yongin-City, KR	40	155
Oh, Se-Tae	Anseong-si, KR	1	6
Park, Jeong-Min	Yongin-City, KR	112	1372
Park, Sung-Kyun	Yongin-City, KR	19	69

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PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14503062

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14503062

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