SYSTEMS AND METHODS FOR DRY PROCESSING FABRICATION OF BINARY MASKS WITH ARBITRARY SHAPES FOR ULTRA-VIOLET LASER MICROMACHINING

Number of patents in Portfolio can not be more than 2000

United States of America Patent

SERIAL NO

14408721

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A system and method for producing binary dry process laser microfabrication masks is disclosed. A laser is focused on a first mask to produce a mask image, the mask image thereafter being reduced by demagnification optics to provide a reduced image. A target is exposed to the reduced image to create features of reduced size from the original mask. The target may be used to form a binary mask capable of withstanding laser radiation power necessary for direct target micromachining. A binary mask may be used to create other binary masks in an iterative process to provide binary masks with successively smaller features based on the image reduction due to the demagnification optics.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
INDIAN INSTITUTE OF TECHNOLOGY KANPURKANPUR UTTAR PRADESH 208016

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
RAMAKRISHNA, Subramaniam Anantha Uttar Pradesh, Kanpur, IN 1 7
RAMKUMAR, Janakarajan Uttar Pradesh, Kanpur, IN 5 8
SINGH, Govind Dayal Uttar Pradesh, Kanpur, IN 4 9

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation