FILM AND METHOD FOR PREPARING THE SAME
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United States of America Patent
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Oct 22, 2015
app pub date -
Dec 11, 2013
filing date -
Dec 21, 2012
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Abstract
A film and a method for preparing the film are provided. A substrate is provided, and a film is formed on at least a part of a surface of the substrate by magnetron sputtering a target under a protective gas and a reactive gas. The target includes polytetrafluoroethylene and magnesium fluoride, and the reactive gas includes at least one selected from a group consisting of CF4 and SiF4.
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