POLYMERIC PRECURSORS FOR PRODUCING GRAPHENE NANORIBBONS AND SUITABLE OLIGOPHENYLENE MONOMERS FOR PREPARING THEM

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United States of America Patent

APP PUB NO 20150299381A1
SERIAL NO

14443250

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention relates to oligophenylene monomers of general formula I, wherein R1 is H, halogene, —OH, —NH2, —CN, —NO2, or a linear or branched, saturated or un-saturated C1-C40 hydrocarbon residue, which can be substituted 1- to 5-fold with halogene (F, Cl, Br, I), —OH, —NH2, —CN and/or —NO2, and wherein one or more CH2-groups can be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR3—, wherein R3 is an optionally substituted C1-C40 hydrocarbon residue, or an optionally substituted aryl, al-kylaryl, alkoxyaryl, alkanoyl or aroyl residue; R2a and R2b are H, or optionally one or more of the pairs of adjacent R2a/R2b is joined to form a single bond in a six-membered carbocycle; m is an integer of from 0 to 3; n is 0 or 1; and X is halogene or trifluoromethylsulfonate, and Y is II; or X is II, and Y is halogene or trifluoromethylsulfonate. The invention further relates to polymeric precursors as well as methods for preparing graphene nanoribbons from the oligophenylene monomers and the polymeric precursors.

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Patent Owner(s)

Patent OwnerAddress
BASF SELUDWIGSHAFEN GERMANY LUDWIGSHAFEN RHINELAND-PALATINATE
MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E VMUNICH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CAI, Jinming Zuerich, CH 6 7
FASEL, Roman Zuerich, CH 7 16
FENG, Xinliang Mainz, DE 21 152
MUELLEN, Klaus Mainz, DE 62 493
NARITA, Akimitsu Mainz, DE 4 5
RUFFIEUX, Pascal Plasselb, CH 7 16

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