PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF
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United States of America Patent
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app pub date -
Jun 26, 2015
filing date -
Aug 13, 2013
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Abstract
The invention relates to a photosensitive polysiloxane composition and a thin film formed by the aforementioned photosensitive polysiloxane composition. The thin film is a planarization film of a TFT substrate, an interlayer insulating film or an overcoat of a core material or a protective material in a waveguide. The thin film is cured at low temperature. The photosensitive polysiloxane composition comprises a polysiloxane (A), an o-naphthoquinone diazide sulfonic acid ester (B), a thermal base generator (C) and a solvent (D).
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