Device and method for exhaust gas treatment on CVD reactor
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United States of America Patent
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Jun 25, 2019
Grant Date -
Oct 15, 2015
app pub date -
Apr 14, 2015
filing date -
Apr 14, 2014
priority date (Note) -
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Abstract
A first and second process gas is fed into a device during a first and second process step, respectively. The device has an exhaust gas line through which a first and second exhaust gas is conveyed out of the device in the first and second process step, respectively. A first and second exhaust gas device is connected by means of a valve arrangement optionally to the exhaust gas line in a fluidly communicable and separable manner, with a first and second treatment member for treating an exhaust gas produced in the first and second process step, respectively. A gas feed device is arranged between the valve arrangement and the respective treatment members. A control device is provided whose control variable is the pressure difference between the total pressure in the respective exhaust gas devices and is configured to minimize the pressure difference during switching of the valve arrangement.
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