POLISHING COMPOSITION
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United States of America Patent
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Issued Date -
Oct 15, 2015
app pub date -
Jun 25, 2013
filing date -
Oct 31, 2012
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Abstract
Provided is a polishing composition with which a high glossy surface is achieved by enhancing smoothness of a surface of an alloy material while maintaining a sufficiently high polishing speed for the alloy material. The present invention relates to a polishing composition used for an application of polishing an alloy material, which contains silica particles having a primary particle average aspect ratio of at least 1.10 and a pH controlling agent.
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