PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20150285973A1
SERIAL NO

14668998

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a compound (A) containing an ethylenically unsaturated group, an alkali-soluble resin (B), a photoinitiator (C), a pigment (D), and an organic solvent (E). The compound (A) containing an ethylenically unsaturated group includes a first compound (A-1) containing an ethylenically unsaturated group. The first compound (A-1) containing an ethylenically unsaturated group has two or more groups represented by formula (1) and does not have an aromatic skeleton. The photosensitive resin composition has the advantages of high precision pattern linearity and good alkali solution resistance.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ho, Wei-Kai Nantou County, TW 2 2
Hsu, Jung-Pin Tainan City, TW 22 37

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation