ANALYTE SENSOR AND FABRICATION METHODS
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United States of America Patent
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Issued Date -
Oct 1, 2015
app pub date -
Oct 7, 2013
filing date -
Oct 30, 2012
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Abandoned
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Abstract
Methods for fabricating analyte sensor components using IC- or MEMs-based fabrication techniques and sensors prepared therefrom. Fabrication of the analyte sensor component comprises providing an inorganic substrate having deposited thereon a release layer, a first flexible dielectric layer and a second flexible dielectric layer insulating there between electrodes, contact pads and traces connecting the electrodes and the contact pads of a plurality of sensors. Openings are provided in one of the dielectric layers over one or more of the electrodes to receive an analyte sensing membrane for the detection of an analyte of interest and for electrical connection with external electronics. The plurality of fabricated sensor components are lifted off the inorganic substrate. Methods of improving sensor performance by solution based and non-solution based etching are provided.
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