METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE
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United States of America Patent
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Issued Date -
Oct 1, 2015
app pub date -
Aug 6, 2014
filing date -
Mar 25, 2014
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Abstract
A method for forming an actuator layer of a MEMS device is disclosed. The method comprising etching the actuator layer and annealing the actuator layer after etching to reduce surface roughness of the MEMS device.
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