POLISHING PAD AND METHOD FOR PRODUCING SAME
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United States of America Patent
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Issued Date -
Oct 1, 2015
app pub date -
Jun 25, 2013
filing date -
Oct 31, 2012
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Abandoned
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Abstract
An object of the present invention is to provide a polishing pad capable of maintaining a high level of dimensional stability upon moisture absorption or water absorption though it has high water absorption property and which hardly causes scratches on the surface to be polished of an object to be polished, and a method for producing the same. A polishing pad having a polishing layer comprising a polyurethane foam having fine cells, wherein the polyurethane foam includes a reaction cured body of a polyurethane raw material composition containing (1) an isocyanate-terminated prepolymer (A) obtained by reacting a prepolymer raw material composition (A′) containing an isocyanate monomer, a high molecular weight polyol (a) and a low molecular weight polyol, (2) an isocyanate-terminated prepolymer (B) obtained by reacting a prepolymer raw material composition (B′) containing a polymerized diisocyanate and a high molecular weight polyol (b), and (3) a chain extender; and the polymerized diisocyanate contains pentamers or higher oligomers in an amount of 40% by weight or less.
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