SUBSTRATE PROCESSING DEVICE
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United States of America Patent
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Issued Date -
Sep 17, 2015
app pub date -
Aug 29, 2013
filing date -
Oct 16, 2012
priority date (Note) -
Abandoned
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Abstract
A substrate processing apparatus includes a substrate holding unit that holds a substrate in a horizontal position, a processing liquid supplying unit that supplies the processing liquid to the surface of the substrate held by the substrate holding unit, a substrate rotating unit that rotates the substrate held by the substrate holding unit, a heater that opposes the substrate held by the substrate holding unit, a heater supporting member that supports the heater independently of the substrate holding unit and a moving unit that moves at least one of the substrate holding unit and the heater supporting member such that the heater and the substrate held by substrate holding unit approach/leave each other.
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