PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
May 19, 2015
filing date -
Oct 24, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a compound (F) represented by Formula (a) and an epoxy resin (G) containing a fluorene skeleton represented by Formula (b). The photosensitive resin composition for the black matrix has the advantage of reducing film shrinkage and reducing roughness.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully