MODIFIED LITHIUM COBALT OXIDE SPUTTERING TARGETS
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United States of America Patent
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Sep 3, 2015
app pub date -
Feb 24, 2015
filing date -
Feb 28, 2014
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Abstract
A modified and improved lithium cobalt oxide sputtering target with reduced resistivity is described. Unique modifications to the composition of the lithium cobalt oxide target allow adjustment or fine-tuning of the resistance of the target not previously possible. Incorporation of a controlled amount of one or more conductive materials into the lithium cobalt oxide composition is described alone or in combination with altering the stoichiometric ratio of Li:Co to significantly reduce resistivity and thereby enhance conductivity of the target. The result is a modified sputtering target capable of sputtering lithium-containing thin films that does not exhibit deterioration of their properties by virtue of elevated levels of conductive containing material incorporated into the target.
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