DIGITAL EXPOSURE METHOD AND DIGITAL EXPOSURE APPARATUS FOR PERFORMING THE SAME
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United States of America Patent
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Issued Date -
Sep 3, 2015
app pub date -
Aug 14, 2014
filing date -
Mar 3, 2014
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Abstract
A method for digitally exposing a substrate includes generating first horizontal pattern area graphic data and second horizontal pattern area graphic data, where the first horizontal pattern area graphic data corresponds to a first pattern, and the second horizontal pattern area graphic data corresponds to a second pattern, generating a second light incident into the substrate by changing a light path of a first light based on the first horizontal pattern area graphic data and the second horizontal pattern area graphic data, and forming a first pattern on the substrate from the first horizontal pattern area graphic data and a second pattern on the substrate spaced apart in a first direction from the first pattern from the second horizontal pattern area graphic data by exposing the substrate with the second light in a second direction perpendicular to the first direction in a plan view.
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