Dynamic optical head layer and lithography method using the same
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United States of America Patent
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Dec 13, 2016
Grant Date -
Sep 3, 2015
app pub date -
Mar 2, 2015
filing date -
Feb 28, 2014
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Abstract
The present invention relates to a dynamic optical head layer in an optical lithography system forming patterns on a substrate, the dynamic optical head layer being detachably mounted on the substrate, and the dynamic optical head layer includes a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, wherein the dynamic nano aperture layer is made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer are made of oxide-based materials, nitride-based materials, and carbide-based materials.
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