PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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United States of America Patent
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app pub date -
Apr 29, 2015
filing date -
Oct 31, 2012
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Abandoned
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Abstract
There is provided a pattern forming method including:
- (a) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit (a0) having a —SO2— group and a repeating unit (a1) having a group which decomposes by the action of an acid to generate a polar group, in which a molar average of C log P values of the respective monomers corresponding to repeating units except for the repeating unit (a0) is 2.0 or more; and(B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (b) exposing the film; and(c) developing the film exposed by using a developer including an organic solvent to form a negative pattern.
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