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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	TOKYO 103-6020

International Classification(s)

• C07D:HETEROCYCLIC COMPOUNDS
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Fujita, Shingo	Osaka, JP	32	350
Ichikawa, Koji	Osaka, JP	316	1995
Masuyama, Tatsuro	Osaka, JP	69	357

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Aug 7, 2028

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 07, 2017	US,9563123,B2   US9563123B2	GRANTED PATENT AS SECOND PUBLICATION
September 03, 2015	US,20150248052,A1   US20150248052A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent Application No: 2015/0248,052

PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN

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