X-ray surface analysis and measurement apparatus
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United States of America Patent
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Mar 14, 2017
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Mar 1, 2015
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Feb 28, 2014
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Abstract
This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.
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