Polishing-Material Reclamation Method
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United States of America Patent
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Sep 3, 2015
app pub date -
Jul 24, 2013
filing date -
Jul 25, 2012
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Abstract
Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing material is reclaimed from a polishing-material slurry including already used polishing material by undergoing: recovering the polishing-material slurry used to polish an object having silicon as a main component thereof; adjusting the pH of the recovered polishing-material slurry to be in the range of 7-10; adding an alkali earth metal-containing metal salt as an inorganic salt to the pH adjusted polishing-material slurry, to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; and the polishing material, having been separated and concentrated, is subjected to solid-liquid separation, and recovered.
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