Thermal processing apparatus

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United States of America Patent

PATENT NO 9579740
APP PUB NO 20150246405A1
SERIAL NO

14430526

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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To provide a thermal processing apparatus where a projection area perpendicular to the axis of a sealing structure and attachment structure of heat radiation heater is decreased and a chamber volume is decreased. The apparatus has a chamber for accommodating a workpiece of a thermal processing object, the chamber having a partition wall for partitioning inside from outside of the chamber, a heat radiation heater disposed penetrating the partition wall, wherein the heater has a ring seal arranged on an outer peripheral surface of the extension section, and hermetically sealing the chamber, and a heat blocking plate arranged between the heat radiation unit and the ring seal in the axial direction of the glass tube, for blocking heat radiated from the heat radiation unit to the ring seal, the heat blocking plate having an inner peripheral surface fitting along the extension section.

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Patent Owner(s)

Patent OwnerAddress
ORIGIN COMPANY LIMITED3-3-27 SAKAWA SAKURA-KU SAITAMA-SHI SAITAMA 338-0823

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akama, Hiroshi Tokyo, JP 61 891
Kuroda, Masami Tokyo, JP 65 448
Matsumoto, Yutaka Tokyo, JP 90 878
Nishimura, Hironobu Tokyo, JP 22 215

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