Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium
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United States of America Patent
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Nov 27, 2018
Grant Date -
Sep 3, 2015
app pub date -
Feb 25, 2015
filing date -
Feb 28, 2014
priority date (Note) -
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Abstract
The present disclosure provides an apparatus for generating a processing gas by bubbling a raw material liquid with a carrier gas. The processing gas generated by the bubbling is taken out from a vapor-phase portion above a liquid-phase portion of the raw material liquid through a taking-out unit. A first temperature adjusting unit performs a temperature adjustment of the liquid-phase portion and a second temperature adjusting unit performs a temperature adjustment of the vapor-phase portion such that the temperature of the vapor-phase portion is higher than the temperature of the liquid-phase portion.
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