Control of FET Back-Channel Interface Characteristics
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United States of America Patent
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Issued Date -
Aug 27, 2015
app pub date -
Feb 27, 2014
filing date -
Feb 27, 2014
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Abandoned
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Abstract
A method and structure for control of FET back-channel interface characteristics of an integrated circuit by implanting of selected implantation species at or near a device interface accessible during manufacture of the integrated circuit using layer transfer technology, without adversely affecting the structure or characteristics of a principal front-side FET.
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