PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE SAME

United States of America Patent

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Issued Date
Aug 27, 2015
app pub date
Feb 19, 2015
filing date
Feb 26, 2014

priority date (Note)
Abandoned

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Abstract

A photoresist composition includes a photosensitive copolymer having a repeating unit from a vinyl sulfone monomer, and a solvent.

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Patent Owner(s)

Patent Owner	Address
SAMSUNG ELECTRONICS CO LTD	SUWON-SI GYEONGGI-DO 16677
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION	1 GWANAK-RO GWANAK-GU SEOUL 08826

International Classification(s)

G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
HONG, Suk-Koo	Seongnam-si, KR	7	6
KIM, Dong-Gyun	Seoul, KR	22	144
KWON, Su-Jee	Seoul, KR	1	3
LEE, Hyung-Rae	Hwaseong-si, KR	13	113
LEE, Jong-Chan	Seoul, KR	58	300
LEE, Joon-Je	Suwon-si, KR	2	4

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PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14625954

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14625954

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