Pulsed plasma monitoring using optical sensor and a signal analyzer forming a mean waveform
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United States of America Patent
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Dec 1, 2015
Grant Date -
Aug 27, 2015
app pub date -
Feb 25, 2014
filing date -
Feb 25, 2014
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Abstract
Monitoring of a pulsed plasma is described using an optical sensor. In one example, the invention includes receiving light emitted by a pulsed plasma in a semiconductor plasma processing chamber, sampling the received light at a sampling rate higher than a pulse rate of the pulsed plasma, wherein the sampled light has a periodic amplitude waveform and the sampling rate is higher than the period of the amplitude waveform, accumulating multiple sampled waveforms to form a mean waveform, and transmitting characteristics of the mean waveform to a chamber control tool.
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