METHOD FOR FORMING NANOSCALE MICROSTRUCTURE
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United States of America Patent
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Issued Date -
Aug 27, 2015
app pub date -
May 13, 2014
filing date -
Feb 24, 2014
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Abstract
A method for forming nanoscale microstructures by solvent etching comprises steps of preparing nanospheres and placing the nanospheres onto a surface of a liquid and allowing the nanospheres to be regularly arranged to form a template. The template is transferred to the photocurable adhesive of the substrate to form a photocured adhesive layer. After photocuring the photocurable adhesive to form a photocured adhesive layer, the substrate is removed and the template and the photocured adhesive layer are placed into a solvent with insignificant polarity to perform etching by dissolving the template with the solvent to form the nanoscale microstructure on the photocured adhesive layer. The method does not require large-scale machines, expensive equipments, and long processing time of molecular self-assembly. In addition to the above advantages, this method is not limited by size of substrates.
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