Photocurable Resin Composition for Imprinting, Method for Producing Imprinting, Mold and Imprinting Mold

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United States of America Patent

APP PUB NO 20150240015A1
SERIAL NO

14433991

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a photocurable resin composition for producing an imprinting mold which has superior releasability from a transfer target resin and is flexible. The photocurable resin composition does not undergo curing shrinkage when subjected to photo-imprinting as a transfer target of photo-imprinting; and is capable of producing by photo-imprinting an imprinting mold which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition for imprinting includes a (meth)acrylic monomer (A), a silicon-containing monomer (B) and a photoinitiator (C), wherein the photoinitiator includes a combination of an alkylphenone-based photoinitiator (C1) and an acylphosphine oxide-based photoinitiator (C2).

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Patent Owner(s)

Patent OwnerAddress
SOKEN CHEMICAL & ENGINEERING CO LTDNO 29 NO 5 GAO TIAN 3 TOKYO JAPAN TOKYO TOKYO METROPOLIS

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suto, Yasuo Sayama-shi, JP 6 11
Yamada, Hiroko Sayama-shi, JP 12 27

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