SOLVENT ANNEALING OF BLOCK COPOLYMER FILMS UNDER SUPER-SATURATED ATMOSPHERES
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United States of America Patent
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Issued Date -
Aug 27, 2015
app pub date -
Feb 21, 2014
filing date -
Feb 21, 2014
priority date (Note) -
Abandoned
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Abstract
In one embodiment, a system for solvent annealing of a block copolymer film includes a solvent annealing chamber, and a controller configured to control at least one processing parameter for inducing a super-saturation of a solvent in an atmosphere within the solvent annealing chamber. In another embodiment, a method for solvent annealing of a block copolymer film includes inducing a super-saturation of a solvent in an atmosphere within a solvent annealing chamber having a block copolymer film therein for inducing formation of polymeric domains.
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