Method and system of chemical bath deposition
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United States of America Patent
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Sep 6, 2016
Grant Date -
Aug 27, 2015
app pub date -
Feb 21, 2014
filing date -
Feb 21, 2014
priority date (Note) -
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Abstract
An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.
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