Substrate transport roller
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United States of America Patent
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Jan 24, 2017
Grant Date -
Aug 27, 2015
app pub date -
Nov 25, 2013
filing date -
Dec 21, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a substrate transport roller (2a) capable of ensuring a broad temperature-control region on a substrate, without reducing substrate transport quality. This substrate transport roller (2a) is provided in a film-forming device (1) for executing a film-forming process on the surface of a film substrate (W), transports the film substrate (W) by rotating around a center axis, and is equipped with: a center-section segment (13a) positioned in the center section in the axial direction extending along the center axis, and having a first outer-circumferential surface; end-section segments (12a, 12b) positioned on both sides on the outside in the axial direction of the center-section segment (13a), and each having a second outer-circumferential surface which contacts the substrate (W) and has a larger diameter than that of the first outer-circumferential surface; a center-section-rising-falling-temperature-medium mechanism for changing the temperature of the center-section segment (13a); and a both-end-section-rising-falling-temperature mechanism for changing the temperature of each of the end-section segments (12a, 12b) independently from the center-section segment (13a).
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