Blade for Substrate Edge Protection During Photolithography
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United States of America Patent
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Issued Date -
Aug 20, 2015
app pub date -
Oct 2, 2013
filing date -
Oct 5, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus protects a portion of a peripheral region (310) of a photoresist-coated surface of a substrate (308) from light exposure. The apparatus includes a blade (502, 512, 522, 532) that can move, or that can move and rotate, and a drive assembly (504, 514, 524, 534) operably coupled to the blade. In response to at least one first drive force generated by the drive assembly, the blade translates, rotates, or translates and rotates, such that the blade is disposed above a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the blade translates, rotates, or rotates and translates, such that the blade is not disposed above a portion of the peripheral region. In a step-and-repeat lithographic system, the blade covers a portion of the peripheral region, and the adjacent portion of the substrate is exposed to light.
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