POSITIONING APPARATUS, PROCESSING APPARATUS USING THE SAME, AND POSITIONING METHOD AND PROCESSING METHOD USING THE SAME
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United States of America Patent
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Aug 20, 2015
app pub date -
Dec 23, 2014
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Feb 14, 2014
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Abstract
A positioning apparatus, a processing apparatus using the same, and a positioning method and a processing method using the same. The positioning apparatus includes a substrate to which a particle is provided, a trapping light source providing trapping light to trap the particle, a positioner adjusting a distance between the particle and the substrate, and a photodetector measuring a change in intensity of scattered light depending upon deviation of a focus of the trapping light from the particle. According to the present invention, it is possible to process an object with nanoscale precision. In addition, the positioning apparatus and the processing apparatus can be composed of simple and small devices with high processing accuracy.
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