Polishing agent, polishing agent set and method for polishing base

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9163162
APP PUB NO 20150232704A1
SERIAL NO

14424970

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Abstract

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A polishing agent according to one embodiment of the present invention contains a liquid medium, an abrasive grain including a hydroxide of a tetravalent metal element, a polymer compound having an aromatic ring and a polyoxyalkylene chain, and a cationic polymer, wherein a weight average molecular weight of the polymer compound is 1000 or more.

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Patent Owner(s)

Patent OwnerAddress
RESONAC CORPORATION13-9 SHIBA DAIMON 1-CHOME MINATO-KU TOKYO 105-8518

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akutsu, Toshiaki Hitachi, JP 21 222
Fujisaki, Koji Kokubunji, JP 22 299
Iwano, Tomohiro Hitachi, JP 56 332
Minami, Hisataka Hitachi, JP 28 207

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