Method of Treating a Porous Substrate and Manufacture of a Membrane
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United States of America Patent
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Issued Date -
Aug 20, 2015
app pub date -
Jul 25, 2013
filing date -
Aug 24, 2012
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Abstract
Method of treating a substrate (11), comprising: •providing a treatment space (5) between at least two opposing electrodes (2,3), filling the treatment space with a gas composition, •placing the substrate, which is a porous substrate, in the treatment space, generating an atmospheric pressure glow discharge plasma between the at least two opposing electrodes, and •subjecting the porous substrate to the atmospheric pressure glow discharge plasma, thereby creating micro-pores uniformly throughout the porous substrate, •wherein the atmospheric pressure glow discharge plasma in the treatment space has a specific energy of 10 J/cm or higher, and wherein the treatment space comprises oxygen in the range of 0.1 to 21% vol. %. The resultant substrates are useful for ion exchange.
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