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Abstract

A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions:

description='In-line Formulae' end='lead'[TiO₂]=(c+f(x,y,z)), anddescription='In-line Formulae' end='tail'

description='In-line Formulae' end='lead'[SiO₂]=(100−{c+f(x,y,z)}−δ(x,y,z))description='In-line Formulae' end='tail'

wherein [TiO₂] is the concentration of titania in wt. %, [SiO₂] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (T_zc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

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First Claim