SUBSTRATE PROCESSING DEVICE
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United States of America Patent
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Issued Date -
Jul 30, 2015
app pub date -
Aug 23, 2013
filing date -
Aug 28, 2012
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to a substrate is performed includes a main chamber having an opened upper side, the main chamber including a passage defined in a side thereof so that the substrate is loaded or unloaded through the passage, a susceptor disposed within the main chamber to allow the substrate to be placed thereon, a chamber cover disposed on the opened upper side of the main chamber, the chamber cover including an upper installation space defined above the susceptor and a gas supply passage disposed outside the upper installation space, a heating block disposed in the upper installation space to heat the substrate, and a gas supply port connected to the gas supply passage to supply a process gas into the process space.
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