Polishing-Material Reclamation Method

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United States of America Patent

APP PUB NO 20150210890A1
SERIAL NO

14417302

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing is reclaimed from a polishing-material slurry by undergoing: recovering in step (A) a polishing-material slurry including already used polishing material; adding in step (B) an alkali earth metal-containing metal salt to the recovered polishing-material slurry to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; the polishing material, having had been separated and concentrated, is subjected in step (C) to solid-liquid separation, and recovered; and using in step (D) a magnetic filter to filter and remove metal particles included in the polishing-material slurry. Step (D) is performed at the same time as step (B) or step (C), or performed after either step (A), step (B), or step (C).

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Patent Owner(s)

Patent OwnerAddress
KONICA MINOLTA INC2-7-2 MARUNOUCHI CHIYODA-KU TOKYO 100-7015

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inui, Chie Hino-shi, JP 17 21
Maezawa, Akihiro Hino-shi, JP 65 260
Nagai, Yuuki Tachikawa-shi, JP 20 34

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