Antimony-Rich High-speed Phase-change Material Used In Phase-Change Memory, Preparing Method, And Application Thereof

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United States of America Patent

APP PUB NO 20150207070A1
SERIAL NO

14129957

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Abstract

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The present invention relates to a metal element doped phase-change material in the field of micro-electronics technologies, specifically to an antimony-rich high-speed phase-change material used in a phase-change memory (PCRAM), a preparing method and an application thereof. The antimony-rich high-speed phase-change material used in a PCRAM has a chemical formula being Ax(Sb2Te)1−x, x is an atom percent, where A is selected from W, Ti, Ta, and Mn, and 0

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY CHINESE ACADEMY OF SCIENCES200050 NO 865 CHANGNING ROAD SHANGHAI CHANGNING DISTRICT SHANGHAI CITY SHANGHAI CITY 200050

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Peng, Cheng Shanghai, CN 95 261
Rao, Feng Shanghai, CN 41 642
Song, Zhitang Shanghai, CN 31 358
Wu, Liangcai Shangcai, CN 5 12
Zhu, Min Shanghai, CN 244 15096

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