AUTO FOCUS METHOD AND AUTO FOCUS APPARATUS

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United States of America Patent

SERIAL NO

14670419

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Abstract

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An auto focus (AF) method adapted to an AF apparatus is provided. The AF method includes following steps. A first image is captured by using the first image sensor. At least one characteristic is detected based on the first image, and whether the characteristic meets a predetermined condition is determined. If the characteristic meets the predetermined condition, a focus depth is calculated according to a three-dimensional (3D) depth information and movement of a first lens of the first sensor is driven according to the focus depth for focusing. If the characteristic does not meet the predetermined condition, the first lens is driven to move for many times to obtain a plurality of contrast values, such that movement of the first lens is driven according to the contrast values for focusing. Additionally, an AF apparatus is provided.

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Patent Owner(s)

Patent OwnerAddress
ALTEK SEMICONDUCTOR CORP3F NO 12 LIXING RD EAST DIST HSINCHU CITY 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Wen-Yan Miaoli County, TW 36 394
Chao, Shan-Lung Hsinchu City, TW 7 40
Chou, Hong-Long Hsinchu County, TW 87 648
Huang, Yu-Chen Hsinchu County, TW 53 256
Kang, Chung-Chia Tainan City, TW 8 98

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