TWO TERMINAL RESISTIVE SWITCHING DEVICE STRUCTURE AND METHOD OF FABRICATING
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United States of America Patent
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app pub date -
Mar 24, 2015
filing date -
Jul 13, 2010
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Abstract
A semiconductor device having a memory device includes a semiconductor substrate, a first dielectric layer disposed above the semiconductor substrate, a first adhesion layer disposed upon the first dielectric layer, a bottom wiring metal disposed upon the first adhesion layer, a first barrier layer disposed upon the bottom wiring metal, a resistive switching material disposed in electrical contact with the first barrier layer, wherein the resistive switching material comprises a silicon material having a plurality of defect regions, a conductive metal material disposed upon the resistive switching material, wherein the conductive metal material comprises a plurality of conductive metal particles, a second barrier layer disposed upon the conductive metal material, a top wiring metal disposed upon the second barrier layer, and wherein at least some of the plurality of conductive metal particles are removably disposed in defect regions from the plurality of defect regions in the resistive switching material.
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