METHOD OF MANUFACTURING METAL HYDROXIDES AND METHOD OF MANUFACTURING ITO SPUTTERING TARGET
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United States of America Patent
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Issued Date -
Jul 16, 2015
app pub date -
Apr 16, 2013
filing date -
May 31, 2012
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Abandoned
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Abstract
A method of manufacturing metal hydroxides with high mass, and a method of manufacturing an ITO target are provided. A gas diffusion electrode 20 configured such that a hydrophobic gas diffusion layer 20a and a hydrophilic reaction layer 20b are laminated is installed in an electrolytic bath 1 to partition the electrolytic bath. An electrolytic solution S is stored in such a portion of a settling chamber 11 as to face the reaction layer of the partitioned electrolytic bath, and indium 4 is immersed in the electrolytic solution. A voltage is applied between a cathode defined by the gas diffusion electrode and an anode defined by indium. Oxygen is supplied into such a partitioned air chamber 10 as to face the gas diffusion layer to perform electrolysis. Indium hydroxides are thus deposited in the electrolytic solution.
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