PHOTORESIST OVERCOAT COMPOSITIONS

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United States of America Patent

APP PUB NO 20150185607A1
SERIAL NO

14588404

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Photoresist overcoat compositions comprise: a quenching polymer wherein the quenching polymer comprises: a first unit having a basic moiety; and a second unit formed from a monomer of the following general formula (I):

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Patent Owner(s)

Patent OwnerAddress
ROHM AND HAAS ELECRONIC MATERIALS LLC455 FOREST STREET MARLBOROUGH MA 01752

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ANDES, Cecily Newton, US 11 87
LEE, Choong-Bong Westborough, US 15 30
LEE, Christopher Nam Austin, US 6 39
PARK, Jong Keun Westborough, US 65 724

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