PHOTOSENSITIVE STENCILS AND METHODS
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United States of America Patent
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app pub date -
Mar 3, 2015
filing date -
Jun 2, 2010
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Abstract
A photosensitive stencil includes a porous stencil carrier that can be a sheet of woven material with crisscrossing filaments. The stencil carrier is coated with a photopolymer emulsion that is water based to form a stencil blank. In use, a light mask is disposed atop the stencil blank. The light mask can be contained on a sheet of paper or a transparent film. Alternatively the stencil blank is fed through an inkjet printer and the light mask is printed directly onto the stencil blank using common inks. The stencil blank is then exposed to light for a few minutes, which cross-links the photopolymer emulsion in unmasked regions. After exposure, the stencil blank is developed by being washed out with water. The water removes emulsion and adhesive, where present, within areas that were masked by the light mask, revealing open or open regions through which ink or paint can be applied.
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