LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHOD
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United States of America Patent
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app pub date -
Dec 22, 2014
filing date -
Jul 17, 2012
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Abandoned
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Abstract
A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement of the floor in order to restrict a movement of the second component relative to the first component.
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