SKIN CLEANSING COMPOSITION WITH A DEPOSITION COMPONENT
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United States of America Patent
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Issued Date -
Jun 18, 2015
app pub date -
Dec 17, 2013
filing date -
Dec 17, 2013
priority date (Note) -
Abandoned
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Abstract
Materials and apparatus are provided for a skin cleaning composition with a cationic deposition component. The skin cleaning composition includes a keratolytic skin peeling ingredient. The skin cleaning composition further includes at least one surfactant. The skin cleaning composition further includes a cationic deposition component to enhance deposition of the keratolytic skin peeling ingredient onto the skin.
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