ACRYLIC ACID-BASED POLYMER COMPOSITION, METHOD FOR PRODUCING SAME, AND USE THEREFOR

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United States of America Patent

SERIAL NO

14404680

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Abstract

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An acrylic acid-based polymer composition of the present invention is obtained using a hypophosphorous acid compound in an amount of 0.5 to 4.5 parts by mass based on 100 parts by mass of a total of monomers for forming structural units of the acrylic acid-based polymer and adding 1% to 50% by mass of a total amount of the hypophosphorous acid compound to a reactor before supplying the monomer. The phosphorous acid ion is contained in an amount of 20 to 1,000 ppm by mass based on a solid content of the acrylic acid-based polymer.

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Patent Owner(s)

Patent OwnerAddress
TOAGOSEI CO LTD1-14-1 NISHI-SHIMBASHI MINATO-KU TOKYO 1058419 ?1058419

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujiwara, Masahiro Nagoya-shi, JP 74 530

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