Photocurable Resin Composition for Imprinting, Production Method and Structure Thereof

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United States of America Patent

APP PUB NO 20150147533A1
SERIAL NO

14402490

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Abstract

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Provided is a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.

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Patent Owner(s)

Patent OwnerAddress
SOKEN CHEMICAL & ENGINEERING CO LTDNO 29 NO 5 GAO TIAN 3 TOKYO JAPAN TOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyazawa, Yukihiro Sayama-shi, JP 15 41
Suto, Yasuo Sayama-shi, JP 6 11
Yamada, Hiroko Sayama-shi, JP 12 27

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