Plasma processing apparatus and plasma processing method
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United States of America Patent
Stats
-
Nov 22, 2016
Grant Date -
May 28, 2015
app pub date -
Jan 30, 2015
filing date -
Nov 27, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A plasma processing apparatus includes a processing chamber which plasma-processes a sample, a first high-frequency power supply which supplies first high-frequency power for plasma generation to the processing chamber, a second high-frequency power supply which supplies second high-frequency power to a sample stage on which the sample is placed and a pulse generation device which generate first pulses for time-modulating the first high-frequency power and second pulses for time-modulating the second high-frequency power. The pulse generation device includes a control device which controls the first and second pulses so that frequency of the first pulses is higher than frequency of the second pulses and the on-period of the second pulse is contained in the on-period of the first pulse.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- H01J Class
- 2290 Applications Filed
- 1843 Patents Issued To-Date
- 80.49 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- H01J Class
- 20.76 % this patent is cited more than
- 9 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 22, 2028 |
